Synthesis of hollow ellipsoidal silica nanostructures using a wet-chemical etching approach

Journal of Colloid and Interface Science

Volumn 375, Issue 1, 2012, Pages 106-111

  Zhang, Henan ^a   Zhou, Yi ^a   Li, Yueru ^a   Bandosz, Teresa J ^a   Akins, Daniel L ^a  

^a CITY COLLEGE OF NEW YORK   (United States)

Author keywords

Ellipsoidal silica nanostructure; Hollow shells; Self templated; Wet chemical etching

Indexed keywords

APPLICATION REQUIREMENTS; CHEMICAL ETCHING; HOLLOW SHELLS; ONE-STEP PROCESS; SELF-TEMPLATED; SILICA MATERIAL; SILICA NANOPARTICLES; SILICA NANOSTRUCTURES; SILICA SHELL; SYNTHESIS CONDITIONS; UNIFORM SIZE; WET-CHEMICAL ETCHING;

NANOSHELLS; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; SHELLS (STRUCTURES); SYNTHESIS (CHEMICAL); WET ETCHING;

SILICA;

ELLIPSOIDAL SILICA NANOPARTICLE; NANOPARTICLE; NANOSHELL; SILICON DIOXIDE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL PROCEDURES; PARTICLE SIZE; POROSITY; PRIORITY JOURNAL; WET ETCHING APPROACH;

BOROHYDRIDES; MICROSCOPY, ELECTRON, TRANSMISSION; NANOPARTICLES; NANOSPHERES; PARTICLE SIZE; POROSITY; SILICON DIOXIDE; SPECTROSCOPY, FOURIER TRANSFORM INFRARED;

EID: 84862824351     PISSN: 00219797     EISSN: 10957103     Source Type: Journal    
DOI: 10.1016/j.jcis.2012.02.046     Document Type: Article

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