A novel fabrication process of large area triangular nanocavity arrays by bilayer nanosphere lithography

Key Engineering Materials

Volumn 516, Issue , 2012, Pages 447-451

  Wang, Chaoguang ^a   Cui, Hongjuan ^a   Dong, Peitao ^a   Di, Di ^a   Chen, Jian ^a   Wang, Haoxu ^a   Chen, Zhihua ^a   Wu, Xuezhong ^a  

^a NATIONAL UNIVERSITY OF DEFENSE TECHNOLOGY   (China)

Author keywords

Bilayer of PS nanospheres; ICP etching; NSL; Triangular nanocavity arrays

Indexed keywords

GOLD DEPOSITS; METAL NANOPARTICLES; NANOSPHERES; OPTICAL PROPERTIES; PRECISION ENGINEERING; SELF ASSEMBLY; SILICON WAFERS;

FABRICATION PROCESS; ICP ETCHING; METAL DEPOSITION; NANO-CAVITIES; NANOSPHERE LITHOGRAPHY; OXYGEN PLASMA ETCHING; PS NANO SPHERES; TRIANGLE PATTERN;

FABRICATION;

EID: 84862738473     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/KEM.516.447     Document Type: Conference Paper

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