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Journal of the American Chemical Society

Volumn 134, Issue 19, 2012, Pages 8034-8037

Selected deposition of high-quality aluminum film by liquid process

(3) Shen, Zhongrong a,b Matsuki, Yasuo a,c Shimoda, Tatsuya a,b

a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (Japan)

b JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

c JSR CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM FILM; CHEMICAL DAMAGES; DEHYDROGENATION CATALYSIS; DEPOSITED FILMS; ETCHING PROCESS; FILM SURFACES; HIGH CONDUCTIVITY; HIGH QUALITY; LIQUID PROCESS; NANOCRYSTALLINES; SELF-DECOMPOSITION; SOLUTION PROCESS; VACUUM PROCESSING;

EPITAXIAL GROWTH; PLATINUM;

ALUMINUM;

ALUMINUM; NANOCRYSTAL;

ARTICLE; CATALYSIS; CHEMICAL PROCEDURES; CHEMICAL REACTION; CONDUCTANCE; CRYSTAL; DECOMPOSITION; DEHYDROGENATION; LIQUID; MICROFILM; PARTICLE SIZE; QUALITY CONTROL; SURFACE PROPERTY; SYNTHESIS;

EID: 84862094741 PISSN: 00027863 EISSN: 15205126 Source Type: Journal
DOI: 10.1021/ja301956s Document Type: Article

Times cited : (15)

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