Microlens array production in a microtechnological dry etch and reflow process for display applications

Journal of the European Optical Society

Volumn 7, Issue , 2012, Pages

  Knieling, T ^a   Shafi, M ^b   Lang, W ^b   Benecke, W ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^b UNIVERSITY OF BREMEN   (Germany)

Author keywords

Brightness enhancement; Interference display; Light focussing; Microlens array; Microstructures; Quartz glass

Indexed keywords

GLASS; LUMINANCE; MICROLENSES; MICROSTRUCTURE; OPTICAL INSTRUMENT LENSES; PHOTORESISTS; PIXELS; QUARTZ;

COLLIMATED LIGHT; DISPLAY APPLICATION; INTERFERENCE DISPLAYS; METALLIC RINGS; MICRO-LENS ARRAYS; PHOTORESIST REFLOW; QUARTZ GLASS; STRUCTURE TRANSITIONS;

GLASS TRANSITION;

EID: 84862094169     PISSN: None     EISSN: 19902573     Source Type: Journal    
DOI: 10.2971/jeos.2012.12007     Document Type: Article

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