Chemical vapor deposition of polycrystalline Fe 3O 4 thin films by using the cyclohexadiene iron tricarbonyl liquid precursor

Journal of Applied Physics

Volumn 111, Issue 7, 2012, Pages

  Mantovan, R ^a   Vangelista, S ^a   Cocco, S ^a   Lamperti, A ^a   Salicio, O ^a  

^a LABORATORIO MDM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERSION ELECTRONS; CYCLOHEXADIENES; ELECTRICAL QUALITY; ELECTRON SPIN POLARIZATION; LIQUID PRECURSORS; LOW TEMPERATURES; POLYCRYSTALLINE; SSBAUER SPECTROSCOPIES; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY;

ELECTRIC RESISTANCE; LIQUIDS; MAGNETIC MOMENTS; RAMAN SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SPIN POLARIZATION; THIN FILMS; VAPORS; X RAY DIFFRACTION;

CHEMICAL VAPOR DEPOSITION;

EID: 84861749019     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3683082     Document Type: Conference Paper

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