Sulfur-doped nickel oxide thin film as an alternative to Pt for dye-sensitized solar cell counter electrodes

Advanced Energy Materials

Volumn 2, Issue 3, 2012, Pages 334-338

  Guai, Guan Hong ^a,b   Leiw, Ming Yian ^b,c   Ng, Chee Mang ^b   Li, Chang Ming ^a,d  

^a Nanyang Technological University   (Singapore)

^b GLOBALFOUNDRIES SINGAPORE PTE LTD   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d SOUTHWEST UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYTIC SURFACE AREA; CHARGE TRANSFER RESISTANCE; COUNTER ELECTRODES; DYE-SENSITIZED SOLAR CELL; ELECTROCHEMICAL ACTIVITIES; FLUORINE-DOPED; NICKEL OXIDE THIN FILMS; POWER CONVERSION EFFICIENCIES;

CHARGE TRANSFER; PHOTOELECTROCHEMICAL CELLS; REDOX REACTIONS; SOLAR CELLS; SULFUR; THIN FILMS;

NICKEL OXIDE;

EID: 84861676473     PISSN: 16146832     EISSN: 16146840     Source Type: Journal    
DOI: 10.1002/aenm.201100582     Document Type: Article

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