Electrodeposition mechanism of indium sulfide and indium oxi(hydroxi)sulfide thin films from in(III)-thiosulfate acidic aqueous solutions

Journal of the Electrochemical Society

Volumn 159, Issue 6, 2012, Pages

  Chassaing, E ^a   Naghavi, N ^a   Bouttemy, M ^b   Bockelee, V ^a   Vigneron, J ^b   Etcheberry, A ^b   Lincot, D ^a  

^a CNRS   (France)

^b UNIVERSITÉ DE VERSAILLES SAINT QUENTIN EN YVELINES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDIC AQUEOUS SOLUTION; CHEMICAL ENVIRONMENT; COMPACT LAYER; CONDUCTING SUBSTRATES; DEPOSITION CONDITIONS; DEPOSITION POTENTIAL; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL QUARTZ CRYSTAL MICROBALANCE; ELECTRODEPOSITION MECHANISM; ENERGY DISPERSIONS; GOLD-COATED; INDIUM CHLORIDE; INDIUM SULFIDE LAYER; NEGATIVE POTENTIAL; OVERPOTENTIAL; OXYGEN SPECIES; REACTION PATHS; SOLUTION CHEMISTRY; SULFIDE THIN FILMS; SULFUR SOURCE; THEORETICAL SOLUTIONS; THIN FILM SOLAR CELLS; THIOSULFATE IONS; XPS ANALYSIS;

CHEMICAL ANALYSIS; CHLORINE COMPOUNDS; CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; INDIUM; MOLYBDENUM; OXYGEN; REDUCTION; SELENIUM COMPOUNDS; SOLUTIONS; SULFUR; THIN FILMS; VAPOR DEPOSITION;

INDIUM SULFIDE;

EID: 84861407787     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.051206jes     Document Type: Article

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