Intramolecular hole transfer at sensitized TiO 2 interfaces

Journal of the American Chemical Society

Volumn 134, Issue 20, 2012, Pages 8352-8355

  Hu, Ke ^b   Robson, Kiyoshi C D ^a   Johansson, Patrik G ^b   Berlinguette, Curtis P ^a   Meyer, Gerald J ^b  

^a UNIVERSITY OF CALGARY   (Canada)

^b JOHNS HOPKINS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON-TRANSFER; HIGHLY SENSITIVE; HOLE TRANSFER; INJECTED ELECTRONS; INTRAMOLECULAR HOLE TRANSFER; KINETIC DATA; NANOCRYSTALLINE TIO; OPEN-CIRCUIT PHOTOVOLTAGE; RECOMBINATION KINETICS; RECOMBINATION REACTIONS; REDUCTION POTENTIAL; SURFACE DIPOLE; TIO; TRIPHENYL AMINES;

ORGANIC COMPOUNDS; RUTHENIUM; RUTHENIUM COMPOUNDS;

TITANIUM DIOXIDE;

RUTHENIUM DERIVATIVE; TITANIUM DIOXIDE;

ARTICLE; ELECTRIC POTENTIAL; ELECTRON TRANSPORT; INFRARED SPECTROSCOPY; INTRAMOLECULAR HOLE TRANSFER; OXIDATION REDUCTION POTENTIAL; OXIDATION REDUCTION REACTION; OXIDATION REDUCTION STATE; PHOTOOXIDATION;

EID: 84861386191     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja3018175     Document Type: Article

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