High mobility tin oxide deposition with methanol addition

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2011, Pages 002826-002828

  Van Deelen, Joop ^a   Volintiru, Ioanna ^a   De Graaf, A ^a   Poodt, P ^a  

^a TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; BENEFICIAL EFFECTS; CHEMICAL VAPOR DEPOSITION REACTORS; COATED GLASS; DEPOSITION PROCESS; FILM TRANSPARENCY; HIGH MOBILITY; MAIN EFFECT; OXIDE DEPOSITION; OXYGEN PRECURSORS; POINT FLOWS;

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; COALESCENCE; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; PHOTOVOLTAIC EFFECTS; THIN FILMS; TIN; TIN OXIDES; VAPORS;

METHANOL;

EID: 84861047195     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2011.6186533     Document Type: Conference Paper

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