Anomalous Hall effects in Co 2FeSi Heusler compound films and Co 2FeSi-Al 2O 3 granular films

Journal of Applied Physics

Volumn 111, Issue 8, 2012, Pages

  Qin, Zhu ^a   Liu, Xin Dian ^a   Li, Zhi Qing ^a  

^a TIANJIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

2-STRUCTURE; ANOMALOUS HALL EFFECTS; ANOMALOUS HALL RESISTIVITY; CANDIDATE MATERIALS; CO-SPUTTERING METHOD; DIFFERENT MECHANISMS; FE-SI-AL; GRANULAR FILM; HALL SENSITIVITY; HALL SENSOR; HEUSLER COMPOUND; LONGITUDINAL RESISTIVITY; MAGNITUDE ENHANCEMENT; RF SPUTTERING DEPOSITION; ROOM TEMPERATURE; SCALING RELATIONS; TEMPERATURE BEHAVIOR; TEMPERATURE INSENSITIVITY; TYPE STRUCTURES;

ALUMINUM; CARBON DIOXIDE; COBALT COMPOUNDS; FILMS; HALL EFFECT TRANSDUCERS;

COBALT;

EID: 84860530535     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4707846     Document Type: Article

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