Label-Free Electrochemical Imaging of Latent Fingerprints on Metal Surfaces

Electroanalysis

Volumn 24, Issue 5, 2012, Pages 1027-1032

  Qin, Gang ^a   Zhang, Meiqin ^a   Zhang, Ting ^a   Zhang, Yang ^a   McIntosh, Mike ^b   Li, Xiao ^b   Zhang, Xueji ^a,b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b UNIVERSITY OF SOUTH FLORIDA   (United States)

Author keywords

Electrochemical image; Label free; Latent fingerprint; Metal surface; SECM

Indexed keywords

EID: 84860440685     PISSN: 10400397     EISSN: 15214109     Source Type: Journal    
DOI: 10.1002/elan.201100694     Document Type: Article

References (29)

1. G. L. Thomas, T. E. Reynoldson, J. Phys. D, Appl. Phys. 1975, 8, 724.
2. P. V. Haan, Contemp. Phys. 2006, 47, 209.
3. H. C. Lee, R. E. Gaensslen, Advances in Fingerprinting Technology, 2nd ed., CRC Press, London, UK 2001.
4. G. Payne, B. J. Reedy, C. Lennard, B. Comber, D. Exline, C. Roux, Forensic Sci. Int. 2005, 150, 33.
5. D. R. Ifa, N. E. Manicke, A. L. Dill, R. G. Cooks, Science 2008, 321, 805.
6. G. S. Sodhi, J. Kaur, Forensic Sci. Int. 2001, 120, 172.
7. B. Schnetz, P. Margot, Forensic Sci. Int. 2001, 118, 21.
8. M. Sametband, I. Shweky, U. Banin, D. Mandler, J. Almog, Chem. Commun. 2007, 11, 1142.
9. U. Ramminger, U. Nickel, B. Geide, Forensic Sci. 2001, 46, 288.
10. G. Williams, N. McMurray, Forensic Sci. Int. 2007, 167, 102.
11. A. L. Beresford, A. R. Hillman, Anal. Chem. 2010, 82, 483.
12. J. W. Bond, D. Phil, J. Forensic Sci. 2008, 53, 1344.
13. A. J. Bard, M. V. Mirkin, Scanning Electrochemical Microscopy, Marcel Dekker, New York 2001.
14. A. J. Bard, M. V. Mirkin, P. R. Unwin, Phys. Chem. 1992, 96, 1861.
15. F. F. Fan, A. J. Bard, Science 1997, 277, 1791.
16. A. J. Bard, F. F. Fan, M. V. Mirkin, Scanning Electrochemical Microscopy, Vol.18, Marcel Dekker, New York 1994, 244-391.
17. A. J. Bard, F. F. Fan, J. Kwak, O. Lev, Anal. Chem. 1989, 61, 132.
18. A. J. Bard, F. F. Fan, D. T. Pierce, P. R. Unwin, D. O. Wipf, F. Zhou, Science 1991, 254, 68.
19. M. Zhang, A. Becue, M. Prudent, C. Champod, H. H. Girault, Chem. Commun. 2007, 3948.
20. M. Zhang, H. H. Girault, Electrochem. Commun. 2007, 9, 1778.
21. S. Amemiya, A. J. Bard, F. F. Fan, M. V. Mirkin, P. R. Unwin, Anal. Chem. 2008, 1, 95.
22. F. O. Laforge, J. Velmurugan, Y. Wang, M. V. Mirkin, Anal. Chem. 2009, 81, 3143.
23. H. Xiong, D. A. Gross, J. Guo, S. Amemiya, Anal. Chem. 2006, 78, 1946.
24. M. Zhang, G. Wittstock, Y. Shao, H. H. Girault, Anal. Chem. 2007, 79, 4833.
25. M. Zhang, H. H. Girault, Analyst 2009, 134, 25.
26. C. Lee, C. J. Miller, A. J. Bard, Anal. Chem. 1991, 63, 78.
27. Y. Shao, M. V. Mirkin, J. Phys. Chem. 1998, 102, 9915.
28. C. S. Fernando, M. Trauble, F. Li, J. M. Busnel, A. L. Gassner, M. Hojeij, G. Wittstock, H. H. Girault, Anal. Chem. 2009, 81, 6889.
29. A. L. Barker, P. R. Unwin, J. W. Gardner, H. Rieley, Electrochem. Commun. 2004, 6, 91.