Effect of complexing agents and pH on microstructure and tribological properties of Co-W coatings produced by double pulse electrodeposition

Applied Surface Science

Volumn 258, Issue 17, 2012, Pages 6550-6557

  Su, Feng Hua ^a   Liu, Can Sen ^a   Huang, Ping ^a  

^a SOUTH CHINA UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Co W coatings; Electrodeposition; Microstructure; Tribology

Indexed keywords

ALKALINITY; BINARY ALLOYS; COATINGS; COBALT COMPOUNDS; CORROSION; CRYSTAL STRUCTURE; ELECTRODEPOSITION; ELECTRODES; MICROSTRUCTURE; PH EFFECTS; SCANNING ELECTRON MICROSCOPY; SODIUM COMPOUNDS; SULFUR COMPOUNDS; TRIBOLOGY; TUNGSTEN COMPOUNDS; VICKERS HARDNESS; WEAR OF MATERIALS; X RAY DIFFRACTION;

COMPLEXING AGENTS; DOUBLE PULSE ELECTRODEPOSITIONS; EFFECT OF COMPLEXING AGENTS; FRICTION AND WEAR PROPERTIES; MORPHOLOGICAL CHARACTERIZATION; SODIUM GLUCONATE; TRIBOLOGICAL PROPERTIES; W COATING;

COBALT ALLOYS;

EID: 84860234631     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.03.075     Document Type: Article

References (24)

1. H. Capel, P.H. Shipway, and S.J. Harris Wear 255 2003 917 923
2. M. Heydrzadeh Sohi, A.A. Kashi, and S.M.M. Hadavi Journal of Materials Processing Technology 138 2003 219 222
3. Directive 2002/95/EC of the European Parliament and of the Council of 27 January 2003 on the restriction of the use of certain hazardous substances in electrical and electronic equipment, Official Journal of the European Union, L 37 (2003) 19-23.
4. L.P. Wang, Y. Gao, T. Xu, and Q.J. Xue Materials Chemistry and Physics 99 2006 96 103
5. Z.X. Zeng, and J.Y. Zhang Journal of Physics D: Applied Physics 41 2008 185303 185308
6. L. Chen, L.P. Wang, Z.X. Zeng, and J.Y. Zhang Materials Science and Engineering A 418 2006 311 319
7. L. Shi, C.F. Sun, and W.M. Liu Applied Surface Science 254 2008 6880 6885
8. M. Mouanga, L. Ricq, and P. Berot Surface and Coatings Technology 202 2008 1645 1651
9. Y. Zhou, H. Zhang, and B. Qian Applied Surface Science 253 2007 8335 8339
10. C.N. Panagopoulos, V.D. Papachristos, and L.W. Christoffersen Thin Solid Films 366 2000 155 163
11. A.S.M.A. Haseeb, U. Albers, and K. Bade Wear 264 2008 106 112
12. D.P. Weston, P.H. Shipway, S.J. Harris, and M.K. Cheng Wear 267 2009 934 943
13. K.R. Sriraman, S. Ganesh Sundara Raman, and S.K. Seshadri Materials Science and Engineering A 418 2006 303 311
14. Y. Boonyongmaneerat, K. Saengkiettiyut, S. Saenapitak, and S. Sangsuk Surface and Coatings Technology 203 2009 3590 3594
15. G.Y. Wei, H.L. Ge, X. Zhu, L.H. Huang, Q. Wu, X.Q. Wang, and L.M. Huang Applied Surface Science 253 2007 3425 3430
16. F. Lallemand, L. Ricq, E. Deschaseaux, L. De Vettor, and P. Berot Surface and Coatings Technology 197 2005 10 17
17. Z.A. Hamid Materials Letters 57 2003 2558 2564
18. E. Gómez, S. Pané, and E. Vallés Electrochimica Acta 51 2005 146 153
19. D.P. Weston, S.J. Harris, P.H. Shipway, N.J. Weston, and G.N. Yap Electrochimica Acta 55 2010 5695 5708
20. R. Fukui, Y. Katayama, and T. Miura Electrochimica Acta 56 2011 1190 1196
21. E. Gómez, E. Pellicer, and E. Vallés Journal of Electroanalytical Chemistry 556 2003 137 145
22. S.M.S.I. Dulal, H.J. Yun, C.B. Shin, and C.K. Kim Electrochimica Acta 53 2007 934 943
23. G.Y. Wei, H.L. Ge, Q. Wu, Y.D. Yu, X.Q. Wang, and C.Q. Chen Materials Chemistry and Physics 118 2009 57 64
24. S.M.S.I. Dulal, E.A. Charles, and S. Roy Journal of Applied Electrochemistry 34 2004 151 158