Scanning of silicon wafers in contact with aqueous CTAB solutions below the CMC

Langmuir

Volumn 28, Issue 7, 2012, Pages 3360-3368

  Lüderitz, Liset A C ^a   Von Klitzing, Regine ^a  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; COLLOIDAL PROBES; COMBINED IMAGING; HEXADECYL TRIMETHYL AMMONIUM BROMIDE; HYDROPHILIC SURFACES; HYDROPHOBIC DOMAINS; LAPLACE PRESSURE; NANOBUBBLES; SHORT-RANGE ATTRACTION; SILICON WAFER SURFACE; SURFACTANT AGGREGATES; SURFACTANT CONCENTRATIONS; SURFACTANT SOLUTION;

AMMONIUM COMPOUNDS; BROMINE COMPOUNDS; CONTACT ANGLE; HYDROPHILICITY; PROBES; SILICA; SURFACE ACTIVE AGENTS;

SILICON WAFERS;

EID: 84859790940     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la202635a     Document Type: Article

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