17.6 Conversion efficiency multicrystalline silicon solar cells using the reactive ion etching with the damage removal etching

International Journal of Photoenergy

Volumn 2012, Issue , 2012, Pages

  Shim, Ji Myung ^a   Lee, Hyun Woo ^a   Cho, Kyeong Yeon ^a   Seo, Jae Keun ^a   Kim, Ji Soo ^a   Lee, Eun Joo ^a   Choi, Jun Young ^a   Oh, Dong Joon ^a   Shin, Jeong Eun ^a   Kim, Ji Sun ^a   Kong, Ji Hyun ^a   Lee, Soo Hong ^b   Lee, Hae Seok ^a  

^a Shinsung Solar Energy   (South Korea)

^b Sejong University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERSION EFFICIENCY; DROPS; OPEN CIRCUIT VOLTAGE; POLYCRYSTALLINE MATERIALS; POLYSILICON; REFLECTION; SCREEN PRINTING; SILICON SOLAR CELLS; SILICON WAFERS;

EMITTER STRUCTURES; MASK LESS; MULTI-CRYSTALLINE SILICON SOLAR CELLS; MULTICRYSTALLINE SILICON WAFERS; PLASMA INDUCED DAMAGE; REACTIVE-ION ETCHING; SELECTIVE EMITTERS; SHORT-CIRCUIT CURRENTS; TEXTURED SURFACE; TEXTURING TECHNIQUES;

REACTIVE ION ETCHING;

EID: 84859776688     PISSN: 1110662X     EISSN: 1687529X     Source Type: Journal    
DOI: 10.1155/2012/248182     Document Type: Article

References (9)

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