Development of rie-textured silicon solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn 2000-January, Issue , 2000, Pages 371-374

  Damiani, B M ^a   Ludemann R ^a,b   Ruby, D S ^c   Zaidi, S H ^d   Rohatgi, A ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^c SANDIA NATIONAL LABORATORIES   (United States)

^d Gratings Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; EFFICIENCY; REACTIVE ION ETCHING; REFLECTIVE COATINGS; SILICON; SILICON NITRIDE; SOLAR CELLS;

MASS PRODUCTION; MULTICRYSTALLINE; NON-CORROSIVE; PLASMA DAMAGE; REMOVAL TREATMENTS; SOLAR CELL EFFICIENCIES; SURFACE RECOMBINATIONS; TEXTURING TECHNIQUES;

SILICON SOLAR CELLS;

EID: 84949563294     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2000.915843     Document Type: Conference Paper

References (8)

1. M. A. Green, Solar Cells: Operating Principles, Technology and System Applications, Vol. 1. Kensington, New South Wales: University of New South Wales, 1982.
2. J. Zhao, A. Wang, M. A. Green, et al, "19.8% efficient "honeycomb" textured multicrystalline and 24.4% monocrystalline silicon solar cells", Appl. Phys. Lett. 73, 1998, pp. 1991-1993.
3. R. Einhaus, E. Vazsonyi, F. Duerickx, et al, "Recent Progress with Acidic Texturing Solutions on Different Multicrystalline Silicon Materials including Ribbons", Proc. 2nd WCPEC, 1998, pp. 1630-1633.
4. R. R. Bilyalov, R. Lüdemann, W. Wettling, et al, "Multicrystalline Silicon Solar Cells with Porous Silicon Emitter", Sol. Ener. Mater. Sol. Cells 60, 2000, pp. 391-420.
5. M. Schnell, R. Lüdemann and S. Schaefer, "Stain Etched Porous Silicon-A Simple Method for the Simultaneous Formation of Selective Emitter and ARC", Proc. 16th EUPVSEC, 2000, pp. in print.
6. H. Jansen, M. d. Boer, R. Legtenberg, et al, "The black silicon method: a universal method for deter-ming parameter settings of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control", Journal of Micromechanics and Microengineering, 1995, pp. 115-120.
7. Y. Inomata, K. Fukui and K. Shirasawa, "Surface texturing of large area multicrystalline silicon solar cells using reactive ion etching mehod", Sol. Ener. Mater. Sol. Cells 48, 1997, pp. 237.
8. S. Schaefer, H. Lautenschlager, G. Emanuel, et al, "Plasma Etching and its Effect on Minority Charge Carrier Lifetimes and Crystalline Silicon Solar Cells", Proc. 16th EU PVSEC, 2000, pp. (in print).