SCOPUS 정보 검색 플랫폼

Volumn 32, Issue 3, 2012, Pages 192-195

Fabrication of normal-gate field emission display with carbon nanotube

Author keywords

Etching dielectric layer; Field emission; Normal gate

Indexed keywords

CARBON NANOTUBES; DEPOSITION; ELECTROPHORESIS; ETCHING; FIELD EMISSION;

CARBON NANOTUBES (CNTS); DIELECTRIC LAYER; ELECTROPHORETIC DEPOSITIONS; GATE ELECTRODES; LOW COSTS; NORMAL-GATE; TECHNICAL LIMITATIONS;

FIELD EMISSION CATHODES;

EID: 84859771790 PISSN: 16727126 EISSN: None Source Type: Journal
DOI: 10.3969/j.issn.1672-7126.2012.03.03 Document Type: Article

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.