Masquerade: Removing non-sample scattering from integrated reflection intensities

Journal of Applied Crystallography

Volumn 45, Issue 2, 2012, Pages 292-298

  Coome, J A ^a   Goeta, A E ^a   Howard, J A K ^a   Probert, M R ^a  

^a DURHAM UNIVERSITY   (United Kingdom)

Author keywords

computer programs; Masquerade; non sample scattering; ultra low temperature; X ray diffraction

Indexed keywords

ATMOSPHERIC CONDITIONS; CYTIDINE; DATA COLLECTION; DATA QUALITY; DIFFRACTION DATA; MASQUERADE; PROCESSING PROCEDURES; REFLECTION INTENSITY; SCATTERING VECTORS; TEST CASE; ULTRA LOW TEMPERATURES; VERY LOW TEMPERATURES;

BERYLLIUM; COMPUTER PROGRAM LISTINGS; EXPERIMENTS; X RAY DIFFRACTION;

DATA HANDLING;

EID: 84859770490     PISSN: 00218898     EISSN: 16005767     Source Type: Journal    
DOI: 10.1107/S0021889812000702     Document Type: Article

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