On the electrical conductivity of Ti-implanted alumina

Journal of Applied Physics

Volumn 111, Issue 6, 2012, Pages

  Salvadori, M C ^a   Teixeira, F S ^a   Cattani, M ^a   Nikolaev, A ^b   Savkin, K P ^b   Oks, E M ^b   Park, H K ^c   Phillips, L ^c   Yu, K M ^d   Brown, I G ^d  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

^c THOMAS JEFFERSON NATIONAL ACCELERATOR FACILITY   (United States)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL CONDUCTIVITY; HIGH ENERGY IMPLANTATION; HIGH VOLTAGE; METAL SPECIES; PERCOLATION THEORY; PHYSICAL MODEL; SURFACE BREAKDOWN; SURFACE LAYERS;

ELECTRIC CONDUCTIVITY; ION IMPLANTATION; PERCOLATION (SOLID STATE); PLATINUM; SOLVENTS;

ALUMINA;

EID: 84859540251     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3697900     Document Type: Article

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