Electrochemical characterization of La 0.58Sr 0.4Co 0.2Fe 0.8O 3-δ thin film electrodes prepared by pulsed laser deposition

Journal of the Electrochemical Society

Volumn 159, Issue 5, 2012, Pages

  Plonczak, Pawel ^a,b   Søgaard, Martin ^a   Bieberle Hütter, Anja ^b   Hendriksen, Peter Vang ^a   Gauckler, Ludwig J ^b  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AREA-SPECIFIC RESISTANCES; CHEMICAL CAPACITANCE; DEFECT CHEMISTRY MODELS; DENSE FILMS; ELECTROCHEMICAL CHARACTERIZATIONS; IMPEDANCE DATA; IMPEDANCE SPECTROSCOPY; LINEAR DEPENDENCE; OXYGEN NON-STOICHIOMETRY; OXYGEN PARTIAL PRESSURE; OXYGEN SURFACE EXCHANGE; OXYGEN TRANSPORT; POLARIZATION RESISTANCES; POROUS CATHODES; POROUS FILM; SURFACE AREA; SURFACE OXYGEN; SYMMETRICAL CELLS; TEMPERATURE RANGE; TEMPERATURE REGIMES; THIN FILM MICROSTRUCTURES; THIN-FILM ELECTRODE;

ACTIVATION ENERGY; CAPACITANCE; CHEMICAL RESISTANCE; ELECTRODES; FLUORINE; LANTHANUM; MICROSTRUCTURE; OXYGEN; PULSED LASER DEPOSITION; STOICHIOMETRY; THIN FILMS;

COBALT;

EID: 84859347523     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.043204jes     Document Type: Article

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