Effect of precursor concentration on the growth of zinc oxide nanorod arrays on pre-treated substrates

Physica B: Condensed Matter

Volumn 407, Issue 10, 2012, Pages 1543-1545

  Urgessa, Z N ^a   Oluwafemi, O S ^b   Botha, J R ^a  

^a NELSON MANDELA METROPOLITAN UNIVERSITY   (South Africa)

^b WALTER SISULU UNIVERSITY   (South Africa)

Author keywords

Chemical bath deposition; Nanorod arrays; Si substrate; ZnO

Indexed keywords

AS-GROWN; CHEMICAL BATH DEPOSITION METHODS; CHEMICAL-BATH DEPOSITION; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; HIGH INTENSITY; NANOROD ARRAYS; OPTICAL QUALITIES; PL SPECTRA; PRECURSOR CONCENTRATION; ROOM TEMPERATURE; SI SUBSTRATE; SI SUBSTRATES; UV EMISSIONS; VISIBLE EMISSIONS; WELL-ALIGNED; XRD ANALYSIS; ZINC OXIDE NANOROD ARRAYS; ZNO;

ASPECT RATIO; FIELD EMISSION MICROSCOPES; PHOTOLUMINESCENCE SPECTROSCOPY; SILICON; SUBSTRATES; X RAY DIFFRACTION; ZINC OXIDE;

NANORODS;

EID: 84859161598     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2011.09.081     Document Type: Conference Paper

References (16)

1. A.M. Morales, and C.M. Lieber Science 279 1998 208
2. N. Dai, E.W. Wong, Y.Z. Lu, F. Shoushan, and C.M. Libber Nature 375 1995 769
3. Z. Yang, Q. Liu, and L. Yang Mater. Res. Bull. 42 2007 221
4. R.S. Yadav, and A.C. Pandey Physica E 40 2008 660
5. R.C. Wang, C.P. Liu, J.L. Huang, S.J. Chen, and Y.K. Tseng Appl. Phys. Lett. 87 2005 013110
6. F.D. Auret, S.A. Goodman, M. Hayes, M.J. Legodi, H.A. van Laarhoven, and D.C. Look Appl. Phys. Lett. 79 2001 3074
7. K.-S. Kim, and H.W. Kim Physica B: Condens. Matter 328 2003 368
8. K. Ogata, K. Maejima, S. Fujita, and S. Fujita J. Cryst. Growth 248 2003 25
9. Q. Wan, K. Yu, and T.H. Wang Appl. Phys. Lett. 83 2003 2253
10. J. Grabowska, K.K. Nanda, K. McGlynn, J.P. Mosnier, M.O. Henry, A. Beaucamp, and A. Meaney J. Mater. Sci.: Mater. Electron. 16 2005 397
11. T. Hirate, T. Kimpara, S. Nakamura, and T. Satoh Superlattices Microstruct. 42 2007 409
12. D.S. Boyle, K. Govender, and P. OBrien Chem. Commun. 1 2002 80
13. S. Xu, Y. Wei, M. Kirkham, and Z.L. Wang J. Am. Chem. Soc. 130 2008 14958
14. K. Vanheusden, C.H. Seager, W.L. Warren, D.R. Tallant, and J.A. Voigt Appl. Phys. Lett. 68 1996 403
15. X.M. Fan, J.S. Lian, Z.X. Guo, and H.J. Lu Appl. Surf. Sci. 239 2005 176
16. J. Sun, J. Bian, H. Liang, J. Zhao, L. Hu, Z. Zhao, W. Liu, and G. Du Appl. Surf. Sci. 253 2007 5165