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Volumn , Issue , 2002, Pages 485-489
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Characterization and optimization of inorganic Spin on Glass process for inter-metal dielectric using field emission scanning electron microscopy
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Author keywords
[No Author keywords available]
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Indexed keywords
CMP PROCESS;
CVD PROCESS;
DIFFERENT SPEED;
FIELD EMISSION SCANNING ELECTRON MICROSCOPY;
HOT PLATES;
INTER-LAYER DIELECTRIC MATERIALS;
INTER-METAL DIELECTRIC LAYERS;
INTER-METAL DIELECTRICS;
NARROW GAP;
PLANARIZATION;
PROCESS PROCEDURES;
PROCESS SCHEMES;
RAMPING RATE;
SPIN ON GLASS;
SPIN SPEED;
TEMPERATURE TREATMENTS;
VERTICAL FURNACES;
CHEMICAL MECHANICAL POLISHING;
DIELECTRIC MATERIALS;
ELECTRIC PROPERTIES;
EXPERIMENTS;
FIELD EMISSION MICROSCOPES;
GLASS;
LIQUIDS;
OPTIMIZATION;
SILICA;
SPIN GLASS;
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EID: 84859070231
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (1)
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References (3)
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