Advanced colloidal lithography for sub-100 nm lift-off structures

Vacuum

Volumn 86, Issue 9, 2012, Pages 1232-1234

  Homonnay, Nico ^a   Geyer, Nadine ^b   Fuhrmann, Bodo ^a   Leipner, Hartmut S ^a  

^a MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

Colloidal lithography; Lift off; Thin films

Indexed keywords

COLLOIDAL LITHOGRAPHY; LIFT-OFF; LIFT-OFF PROCESS; SUB-100 NM; SUB-WAVELENGTH HOLES;

SCANNING ELECTRON MICROSCOPY;

LITHOGRAPHY;

EID: 84858997081     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2011.04.009     Document Type: Conference Paper

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