Quantification of impurity concentration in Cu2O and CuO via secondary ion mass spectrometry

Physica Status Solidi (B) Basic Research

Volumn 249, Issue 4, 2012, Pages 801-811

  Laufer, Andreas ^a   Reppin, Daniel ^a   Metelmann, Hauke ^a   Geburt, Sebastian ^b   Ronning, Carsten ^b   Leichtweiss, Thomas ^a   Janek, Jürgen ^a   Meyer, Bruno K ^a  

^a JUSTUS LIEBIG UNIVERSITY   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

CuO; Impurities; Secondary ion mass spectroscopy

Indexed keywords

ANTIMONY COMPOUNDS; ARSENIC COMPOUNDS; IMPURITIES; IONS; OXIDE FILMS; OXIDE MINERALS; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY;

CHEMICAL COMPOSITIONS; IMPLANTATION PROFILES; IMPURITY CONCENTRATION; LATERAL DISTRIBUTIONS; QUALITATIVE INFORMATION; RELATIVE SENSITIVITY FACTOR; SECONDARY ION MASS SPECTROSCOPY; SPUTTERED COPPER OXIDES;

COPPER OXIDES;

EID: 84858852838     PISSN: 03701972     EISSN: 15213951     Source Type: Journal    
DOI: 10.1002/pssb.201147407     Document Type: Article

References (34)

1. O. Madelung, Semiconductors: Data Handbook, third ed. ( Springer, Berlin/Heidelberg, 2004).
2. T. Ito, T. Kawashima, H. Yamaguchi, T. Masumi, and S. Adachi, J. Phys. Soc. Jpn. 67, 2125- 2131 (1998).
3. T. Ito, H. Yamaguchi, T. Masumi, and S. Adachi, J. Phys. Soc. Jpn. 67, 3304- 3309 (1998).
4. R. P. Wijesundera, Semicond. Sci. Technol. 25, 045015 (2010).
5. K. Akimoto, S. Ishizuka, M. Yanagita, Y. Nawa, K. P. Goutam, and T. Sakurai, Sol. Energy 80, 715- 722 (2006).
6. A. E. Rakhshani, Solid State Electron. 29, 7- 17 (1986).
7. P. Poizot, S. Laruelle, S. Grugeon, L. Dupont, and J.-M. Tarascon, Nature 407, 496- 499 (2000).
8. M. Hara, T. Kondo, M. Komoda, S. Ikeda, K. Shinohara, A. Tanaka, J. N. Kondo, and K. Domen, Chem. Commun. 357- 358 (1998).
9. M. Hara, H. Hasei, M. Yashima, S. Ikeda, T. Takata, J. N. Kondo, and K. Domen, Appl. Catal. A, Gen. 190, 35- 42 (2000).
10. J. Tamaki, K. Shimanoe, Y. Yamada, Y. Yamamoto, N. Miura, and N. Yamazoe, Sens. Actuators B, Chem. 49, 121- 125 (1998).
11. B. Liao, Q. Wei, K. Wang, and Y. Liu, Sens. Actuators B, Chem. 80, 208- 214 (2001).
12. H. A. Storms, K. F. Brown, and J. D. Stein, Anal. Chem. 49, 2023- 2030 (1977).
13. R. G. Wilson, F. A. Stevie, and C. W. Magee, Secondary Ion Mass Spectrometry ( Wiley, New York, 1989).
14. J. C. Vickerman, A. Brown, and N. M. Reed, Secondary Ion Mass Spectrometry ( Oxford University Press, Oxford, 1989).
15. A. Benninghoven, F. G. Rüdenauer, and H. W. Werner, Secondary Ion Mass Spectrometry ( Wiley, New York, 1987).
16. R. G. Wilson and S. W. Novak, J. Appl. Phys. 69, 466- 474 (1991).
17. S. W. Novak and R. G. Wilson, J. Appl. Phys. 69, 463- 465 (1991).
18. R. G. Wilson, J. Appl. Phys. 63, 5121- 5125 (1988).
19. C. D. Wagner, Discuss. Faraday Soc. 60, 291 (1975).
20. J. Ghijsen, L. H. Tjeng, J. van Elp, H. Eskes, J. Westerink, G. A. Sawatzky, and M. T. Czyzyk, Phys. Rev. B 38, 11322 (1988).
21. N. S. McIntyre, S. Sunder, D. W. Shoesmith, and F. W. J. Stanchell, Vac. Sci. Technol. 18, 714 (1981).
22. D. R. Lide (Ed.), Ionization Potentials of Atoms and Atomic Ions, in: CRC Handbook of Chemistry and Physics ( CRC Press, Boca Raton, 1992), pp. 10- 211.
23. M. Scheer, R. C. Bilodeau, C. A. Brodie, and H. K. Haugen, Phys. Rev. A 58, 2844- 2856 (1998).
24. R. Trainham, G. D. Fletcher, and D. J. Larson, J. Phys. B 20, L777 (1987).
25. C. Blondel, C. Delsart, and F. Goldfarb, J. Phys. B 34, L281- L288 (2001).
26. D. Hanstorp and M. Gustafsson, J. Phys. B 25, 1773 (1992).
27. M. Scheer, H. K. Haugen, and D. R. Beck, Phys. Rev. Lett. 79, 4104- 4107 (1997).
28. N. B. Mansour, C. J. Edge, and D. J. Larson, Nucl. Instrum. Methods Phys. Res. B 31, 313- 316 (1988).
29. E. P. F. Lee, J. M. Dyke, D. K. W. Mok, F. Chau, and W. Chow, J. Chem. Phys. 127, 094306-10 (2007).
30. P. F. Zittel and W. C. Lineberger, J. Chem. Phys. 65, 1236- 1243 (1976).
31. J. M. Dyke, A. Morris, and A. Ridha, J. Chem. Soc. Faraday Trans. 2 78, 2077- 2082 (1982).
32. M. J. Travers, D. C. Cowles, and G. B. Ellison, Chem. Phys. Lett. 164, 449- 455 (1989).
33. T. P. Lippa, S.-J. Xu, S. A. Lyapustina, and K. H. Bowen, J. Chem. Phys. 109, 9263- 9265 (1998).
34. L. S. Wang, H. Wu, S. L. Desai, J. Fan, and S. D. Colson, J. Phys. Chem. 100, 8697 (1996).