GA guided cluster based fuzzy decision tree for reactive ion Etching modeling: A data mining approach

IEEE Transactions on Semiconductor Manufacturing

Volumn 25, Issue 1, 2012, Pages 45-56

  Shukla, Sanjay Kumar ^a   Tiwari, Manoj Kumar ^b  

^a Evalueserve   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

Decision tree; fuzzy clustering; genetic algorithm; inconsistency index; optical emission spectroscopy; reactive ion etching

Indexed keywords

C-FUZZY DECISION TREES; CLUSTER-BASED; DATA MINING TECHNIQUES; FUZZY DECISION TREES; INCONSISTENCY INDEX; MINING TASKS; OPTICAL EMISSIONS; PLASMA EMISSION INTENSITY; PREDICTIVE PROCESS; PROCESS MODELING; PROCESS PARAMETERS; REACTIVE ION; WAFER SURFACE;

BAYESIAN NETWORKS; DATA MINING; DECISION TREES; EMISSION SPECTROSCOPY; FUZZY CLUSTERING; GENETIC ALGORITHMS; GRANULATION; LIGHT EMISSION; REACTIVE ION ETCHING; REGRESSION ANALYSIS; ROUGH SET THEORY;

TREES (MATHEMATICS);

EID: 84858395597     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2011.2173372     Document Type: Article

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