Evaluation of etching on amorphous carbon films in nitric acid

Diamond and Related Materials

Volumn 24, Issue , 2012, Pages 104-106

  Sasaki, Yasushi ^a   Takeda, Aoi ^a   Ii, Kiyoto ^a   Ohshio, Shigeo ^a   Akasaka, Hiroki ^a   Nakano, Masayuki ^b   Saitoh, Hidetoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^b TOKYO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous carbon film; Etching detection; Surface plasmon resonance

Indexed keywords

A-C:H FILMS; ETCHING RATE; FLOW CELLS; HYDROGENATED AMORPHOUS CARBON (A-C:H); IN-SITU; MULTILAYER STRUCTURES; NITRIC ACID SOLUTIONS; SURFACE PLASMON RESONANCE (SPR); THICKNESS OF THE FILM;

AMORPHOUS CARBON; CARBON FILMS; ETCHING; GOLD; MULTILAYER FILMS; MULTILAYERS; SURFACE PLASMON RESONANCE;

NITRIC ACID;

EID: 84858342501     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2011.12.006     Document Type: Article

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