Chemical resistance of DLC thin film deposited PMMA substrates

Surface and Coatings Technology

Volumn 203, Issue 17-18, 2009, Pages 2587-2590

  Ban, Masahito ^a   Yuhara, Taku ^a  

^a NIPPON INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Chemical resistance; Diamond like carbon; Poly(methyl methacrylate)

Indexed keywords

ALKALI SOLUTIONS; BEFORE AND AFTER; CROSS SECTIONS; DIAMOND-LIKE CARBON; DLC COATINGS; DLC THIN FILMS; HIGH STABILITIES; IMMERSION TESTS; NANO-INDENTATION HARDNESS; NEGATIVE BIAS; PEAK INTENSITIES; PLASMA CHEMICAL VAPOR DEPOSITIONS; POLY(METHYL METHACRYLATE); RAMAN SPECTRUM; SCANNING ELECTRON MICROSCOPES; SODIUM HYDROXIDES; SUBSTRATE SURFACES;

ACETONE; ACID RESISTANCE; ALDEHYDES; ALKALINITY; CHEMICAL REACTIONS; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DIAMONDS; DISSOLUTION; ESTERS; MECHANICAL PROPERTIES; ORGANIC SOLVENTS; PLASMA DEPOSITION; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SODIUM; THIN FILM DEVICES; THIN FILMS;

SUBSTRATES;

EID: 67349095059     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.02.051     Document Type: Article

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