Removal of sulphur mustard, sarin and simulants on impregnated silica nanoparticles

Journal of Hazardous Materials

Volumn 211-212, Issue , 2012, Pages 226-232

  Saxena, Amit ^a   Srivastava, Avanish K ^b   Singh, Beer ^b   Goyal, Anshu ^c  

^a Ministry of Defence   (India)

^b DEFENCE RESEARCH AND DEVELOPMENT ESTABLISHMENT   (India)

^c SOLID STATE PHYSICS LABORATORY   (India)

Author keywords

Chemical warfare agents; Degradation; Impregnation; Metal oxide nanoparticles

Indexed keywords

BLISTER AGENTS; CHEMICAL WARFARE AGENTS; DEHYDROHALOGENATION; IMPREGNATED SILICAS; METAL OXIDE NANOPARTICLES; OXIDATION REACTIONS; REACTIVE ADSORBENTS; REACTIVE CHEMICALS; SILICA NANOPARTICLES; SULPHUR MUSTARD; SURFACE AREA; TRICHLOROISOCYANURIC ACID;

AGENTS; CHEMICAL WARFARE; DEGRADATION; IMPREGNATION; METALLIC COMPOUNDS; NANOPARTICLES; PHYSISORPTION; SULFUR;

SYNTHESIS (CHEMICAL);

ADSORBENT; CAMPHORYLSULPHONYL OXAZIRIDINE; CHEMICAL WARFARE AGENT; IMPREGNATED SILICA NANOPARTICLE; MUSTARD GAS; NANOPARTICLE; ORGANOCHLORINE DERIVATIVE; OXAZIRIDINE DERIVATIVE; SARIN; SILICON DIOXIDE; SYMCLOSENE; UNCLASSIFIED DRUG;

ADSORPTION; CHEMICAL WEAPON; DEGRADATION; GEL; HYDROLYSIS; NANOTECHNOLOGY; ORGANIC SULFUR COMPOUND; ORGANOPHOSPHATE; OXIDATION; PARTICLE SIZE; POLLUTANT REMOVAL; REACTION KINETICS; SILICA; SURFACE AREA; TOXIC MATERIAL;

ADSORPTION; ARTICLE; BULK DENSITY; CHEMICAL REACTION KINETICS; CONTROLLED STUDY; DEGRADATION; DEHALOGENATION; DEHYDROHALOGENATION; NANOFABRICATION; OXIDATION; WASTE COMPONENT REMOVAL;

ADSORPTION; CHEMICAL WARFARE AGENTS; DECONTAMINATION; ENVIRONMENTAL POLLUTANTS; KINETICS; MICROSCOPY, ELECTRON, SCANNING; MICROSCOPY, ELECTRON, TRANSMISSION; MUSTARD GAS; NANOPARTICLES; POROSITY; SARIN; SILICON DIOXIDE; SURFACE PROPERTIES; TRIAZINES;

EID: 84858289727     PISSN: 03043894     EISSN: 18733336     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2011.07.117     Document Type: Article

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