Impregnated silica nanoparticles for the reactive removal of sulphur mustard from solutions

Journal of Hazardous Materials

Volumn 161, Issue 2-3, 2009, Pages 933-940

  Singh, Beer ^a   Saxena, Amit ^a   Nigam, Anil Kumar ^a   Ganesan, Kumaran ^a   Pandey, Pratibha ^a  

^a PD Division   (India)

Author keywords

Adsorptive removal; Bis (2 chloroethyl)sulphide (sulphur mustard); Degradation; Impregnation; Metal oxide nanoparticles

Indexed keywords

ACIDS; ASSOCIATION REACTIONS; COLLOIDS; DEGRADATION; FREE RADICAL POLYMERIZATION; METAL RECOVERY; METALLIC COMPOUNDS; NANOPARTICLES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; OXIDES; RATE CONSTANTS; SILICA; SOLUTIONS; SULFUR;

ADSORPTIVE REMOVAL; ADSORPTIVE REMOVALS; BIS-(2-CHLOROETHYL)SULPHIDE (SULPHUR MUSTARD); DEGRADATION PRODUCTS; DEHYDROHALOGENATION; HETEROGENEOUS REACTIONS; HIGH SURFACE AREAS; IMPREGNATED SILICAS; LOW DENSITIES; MESOPOROUS; METAL OXIDE NANOPARTICLES; OXAZIRIDINES; OXIDATION REACTIONS; POLYOXOMETALATES; REACTIVE CHEMICALS; SEM AND TEM; SILICA NANOPARTICLES; SIZE RANGES; SULPHUR MUSTARDS; TRICHLOROISOCYANURIC ACIDS;

REACTION KINETICS;

MUSTARD GAS; NANOPARTICLE; OXAZIRIDINE DERIVATIVE; SILICON DIOXIDE;

ADSORPTION; DEGRADATION; OXIDATION; SCANNING ELECTRON MICROSCOPY; SILICA; SULFUR; TRANSMISSION ELECTRON MICROSCOPY;

ARTICLE; HALOGENATION; OXIDATION; POROSITY;

ADSORPTION; KINETICS; MATERIALS TESTING; METAL NANOPARTICLES; MICROSCOPY, ELECTRON, SCANNING; MICROSCOPY, ELECTRON, TRANSMISSION; MUSTARD GAS; NANOTECHNOLOGY; OXYGEN; SILICON DIOXIDE; SURFACE PROPERTIES; TRIAZINES; WATER PURIFICATION; X-RAY DIFFRACTION;

EID: 56549129785     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2008.04.076     Document Type: Article

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