Optical properties of NiO thin films fabricated by electron beam evaporation

Vacuum

Volumn 86, Issue 8, 2012, Pages 1083-1086

  Jiang, D Y ^a   Qin, J M ^a,b   Wang, X ^a   Gao, S ^a   Liang, Q C ^a   Zhao, J X ^a  

^a CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b INNER MONGOLIA UNIVERSITY FOR NATIONALITIES   (China)

Author keywords

NiO; Optical properties; Photoluminescence

Indexed keywords

ATOMIC FORCE MICROSCOPE (AFM); CRYSTAL QUALITIES; ELECTRON BEAM DEPOSITIONS; ELECTRON BEAM EVAPORATION; MICROSTRUCTURAL PROPERTIES; NIO; NIO THIN FILM; OPTICAL CHARACTERIZATION; QUARTZ SUBSTRATE; REJECTION RATIOS; ROOM TEMPERATURE EMISSIONS;

ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; ELECTRON BEAMS; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; QUARTZ; SUPERCONDUCTING FILMS; THIN FILMS; X RAY DIFFRACTION;

NICKEL OXIDE;

EID: 84858153186     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2011.10.003     Document Type: Article

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