Interfacial study of metal oxide with source-drain electrodes and oxide semiconductor by XPS

Electronic Materials Letters

Volumn 8, Issue 1, 2012, Pages 87-90

  Choi, Woon Seop ^a  

^a Hoseo University   (South Korea)

Author keywords

interfacial study; metallic interlayer; MoO 3; oxide TFT; XPS

Indexed keywords

ANALYTICAL TOOL; CHEMICAL CONFIGURATION; INTERFACIAL STUDY; METAL OXIDES; METALLIC INTERLAYER; MIXED STATE; MOO 3; OXIDE SEMICONDUCTOR; SOLUTION-PROCESSED; SOURCE-DRAIN ELECTRODES; STRUCTURAL CONFIGURATIONS; TEM ANALYSIS; THIN FILM TRANSISTORS (TFT); ZINC-TIN-OXIDE (ZTO);

CHEMICAL ANALYSIS; METALLIC COMPOUNDS; MOLYBDENUM OXIDE; THIN FILM TRANSISTORS; TIN; TIN OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRODES;

EID: 84857952426     PISSN: 17388090     EISSN: 20936788     Source Type: Journal    
DOI: 10.1007/s13391-011-1073-z     Document Type: Article

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