Reactive chemical vapour deposition (RCVD) of non-volatile terbium aromatic carboxylate thin films

Journal of Materials Chemistry

Volumn 22, Issue 11, 2012, Pages 4897-4903

  Kotova, Oxana V ^a,b   Utochnikova, Valentina V ^a   Samoylenkov, Sergey V ^a   Rusin, Alexander D ^a   Lepnev, Leonid S ^c   Kuzmina, Natalia P ^a  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

^b TRINITY COLLEGE DUBLIN   (Ireland)

^c LEBEDEV PHYSICAL INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC CARBOXYLATE; BENZOIC ACID; GASPHASE; METATHESIS REACTIONS; NON-VOLATILE; NON-VOLATILE COMPOUNDS; OPTIMAL PARAMETER; REACTION ZONES; REACTIVE CHEMICALS;

CARBOXYLATION; CARBOXYLIC ACIDS; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; GASES; TERBIUM; TERBIUM COMPOUNDS; THIN FILMS;

DEPOSITION;

EID: 84857578357     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/c2jm13643k     Document Type: Article

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