Antireflection and light trapping of subwavelength surface structures formed by colloidal lithography on thin film solar cells

Progress in Photovoltaics: Research and Applications

Volumn 20, Issue 2, 2012, Pages 135-142

  Tseng, Ping Chen ^a   Tsai, Min An ^a   Yu, Peichen ^a   Kuo, Hao Chung ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

antireflection; colloidal lithography; light trapping; thin film solar cell

Indexed keywords

ANGLES OF INCIDENCE; ANTI-REFLECTION; BACK REFLECTORS; COLLOIDAL LITHOGRAPHY; CRYSTALLINE SILICONS; EFFECTIVE REFRACTIVE INDEX; LIGHT TRAPPING; LIGHT TRAPPING EFFECTS; NANO-ISLANDS; NOVEL DESIGN; PHOTOCURRENT DENSITY; POLYSTYRENE SPHERES; RIGOROUS COUPLED WAVE ANALYSIS; SUB-WAVELENGTH; SURFACE NANOSTRUCTURE; THIN-FILM SOLAR CELLS;

ANTIREFLECTION COATINGS; DIFFRACTION; POLYSTYRENES; REFLECTION; REFRACTIVE INDEX;

FABRICATION;

EID: 84857451887     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.1123     Document Type: Article

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