SCOPUS 정보 검색 플랫폼

Lecture Notes in Electrical Engineering

Volumn 67 LNEE, Issue , 2010, Pages 253-263

Radial basis function network for endpoint detection in plasma etch process

(6) Zhao, Shu Kun a Kim, Min Woo a Han, Yi Seul a Jeon, Se Youn a Lee, Yun Keun a Han, Seung Soo a

a Myong Ji University (South Korea)

Author keywords

Endpoint Detection; Etch Process; Neural Network; OES; RBF

Indexed keywords

END POINT DETECTION; ETCH PROCESS; FUNCTIONAL APPROXIMATION; NETWORK TRAINING; OES; OVER-ETCHING; PLASMA ETCH PROCESS; RBF; REAL-TIME MONITOR; SEMICONDUCTOR MANUFACTURING PROCESS;

EMISSION SPECTROSCOPY; ETCHING; NEURAL NETWORKS; PLASMAS; SEMICONDUCTOR DEVICE MANUFACTURE;

RADIAL BASIS FUNCTION NETWORKS;

EID: 84857116457 PISSN: 18761100 EISSN: 18761119 Source Type: Book Series
DOI: 10.1007/978-3-642-12990-2_29 Document Type: Conference Paper

Times cited : (7)

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