Fine wettability control created by a photochemical combination method for inkjet printing on self-assembled monolayers

Advanced Materials

Volumn 24, Issue 7, 2012, Pages 968-972

  Tsuchiya, Youichi ^a   Haraguchi, Shuichi ^b   Ogawa, Masashi ^b   Shiraki, Tomohiro ^a   Kakimoto, Hidenobu ^c   Gotou, Osamu ^c   Yamada, Takeshi ^c   Okumoto, Kenji ^d   Nakatani, Shuhei ^d   Sakanoue, Kei ^d   Shinkai, Seiji ^b  

^a Fukuoka Industry Academia Symphonicity   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

^c SUMITOMO CHEMICAL CO LTD   (Japan)

^d Image Devices Development Center   (Japan)

Author keywords

Inkjet printing; Self Assembled Monolayers; Surface modification; Wetting

Indexed keywords

COMBINATION METHOD; LOW ENERGIES; UV IRRADIATION; WETTABILITY CONTROL;

LIGHT SOURCES; ORGANIC SOLVENTS; SELF ASSEMBLED MONOLAYERS; SURFACE TREATMENT; WETTING;

INK JET PRINTING;

ANTHRACENE; ANTHRACENE DERIVATIVE; INK; SOLVENT;

ARTICLE; CHEMISTRY; ULTRAVIOLET RADIATION; WETTABILITY;

ANTHRACENES; INK; SOLVENTS; ULTRAVIOLET RAYS; WETTABILITY;

EID: 84856973151     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201104277     Document Type: Article

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