Plasmas as metamaterials: A review

Plasma Sources Science and Technology

Volumn 21, Issue 1, 2012, Pages

  Sakai, Osamu ^a   Tachibana, Kunihide ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARTIFICIAL MATERIAL; BULK PLASMA; ELECTRIC RESPONSE; FUNCTIONAL COMPONENTS; MATERIAL PROPERTY; NEGATIVE REFRACTIVE INDEX; NOVEL FUNCTIONS; PLASMA STRUCTURE;

ELECTROMAGNETIC WAVE PROPAGATION; ELECTROMAGNETIC WAVES; METAMATERIALS; REFRACTIVE INDEX;

PLASMAS;

EID: 84856897827     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/21/1/013001     Document Type: Review

References (95)

1. Rotman W 1962 IEEE Trans. Antennas Propag. 10 82
2. Pendry J B, Holden A J, Stewart W J and Youngs I 1996 Phys. Rev. Lett. 76 4773
3. Pendry J B, Holden A J, Robbins D J and Stewart W J 1999 IEEE Trans. Microw. Theory Tech. 47 2075
4. Pendry J B 2000 Phys. Rev. Lett. 85 3966
5. Shelby R A, Smith D R and Schultz S 2001 Science 292 77
6. Pendry J B, Schurig D and Smith D R 2006 Science 312 1780
7. Awai I 2008 IEEE Microw. Mag. 9 55
8. Yablonovitch E 2000 Science 289 557
9. Noda S and Baba T (ed) 2003 Roadmap on Photonic Crystals (Boston, MA: Kluwer)
10. Sihvola A (ed) 2002 Advances in Electromagnetics of Complex Media and Metamaterials (Dordrecht: Kluwer)
11. Sakai O, Sakaguchi T, Naito T, Lee D S and Tachibana K 2007 Plasma Phys. Control. Fusion 49 B453
12. Tachibana K 2006 IEEJ Trans. Electr. Electron. Eng. 1 145
13. Iza F, Kim G J, Lee S M, Lee J K, Walsh J L, Zhang Y T and Kong M G 2008 Plasma Process. Polym. 5 322
14. Tachibana K 2010 Pure Appl. Chem. 82 1189
15. Mariotti D and Sankaran R M 2010 J. Phys. D: Appl. Phys. 43 323001
16. Tachibana K, Kishimoto Y, Kawai S, Sakaguchi T and Sakai O 2005 Plasma Phys. Control. Fusion 47 A167
17. Ito Y, Sakai O and Tachibana K 2010 Plasma Sources Sci. Technol. 19 025006
18. Shashurin A, Shneider M N, Dogariu A, Miles R B and Keidar M 2010 Appl. Phys. Lett. 96 171502
19. Sakaguchi T, Sakai O and Tachibana K 2007 J. Appl. Phys. 87 073305
20. Sakai O, Naito T and Tachibana K 2010 Phys. Plasmas 17 057102
21. Vidmar R J 1990 IEEE Trans. Plasma Sci. 18 733
22. Bliokh Y P, Felsteiner J and Slutsker Y Z 2005 Phys. Rev. Lett. 95 165003
23. Yuan C X, Zhou Z X and Sun H G 2010 IEEE Trans. Plasma Sci. 38 3348
24. Trivelpiece A W and Gould R W 1959 J. Appl. Phys. 30 1784
25. Forstmann F and Gerhardts R R 1986 Metal Optics Near the Plasma Frequency (Berlin: Springer)
26. Maier S A 2007 Plasmonics: Fundamentals and Applications (New York: Springer)
27. Kalluri D K 1998 Electromagnetics of Complex Media (Boca Raton, FL: CRC Press)
28. Bachynski M P and Graf K A 1964 RCA Rev. 15 3
29. Raizer Y P 1987 Gas Discharge Physics (Berlin: Springer)
30. Tamayama Y, Nakanishi T, Sugiyama K and Kitano M 2011 No-reflection phenomena for chiral media Wave Propagation ed A Petrin (Rijeka: Intech) p 415
31. Smith D R, Vier D C, Koschny Th and Soukoulis C M 2005 Phys. Rev. E 71 036617
32. Sakoda K 2005 Optical Properties of Photonic Crystals (Berlin: Springer)
33. Faith J, Kuo S P and Huang J 1997 Phys. Rev. E 55 1843
34. Danilov A V, Ilchenko S A, Kunavin A T, Markov A V, Sapozhnikov D V, Yakovlev V Y, Permyakov V A, Tsemko S N and Volsky V A 1997 Physica A 241 226
35. Hojo H and Mase A 2004 J. Plasma Fusion Res. 80 89
36. Sakai O, Sakaguchi T and Tachibana K 2005 Appl. Phys. Lett. 87 241505
37. Sakai O, Sakaguchi T, Ito Y and Tachibana K 2005 Plasma Phys. Control. Fusion 47 B617
38. Guo B 2009 Phys. Plasmas 16 043508
39. Qi L, Yang Z, Lan F, Gao X and Shi Z 2010 Phys. Plasmas 17 042501
40. Naito T, Sakai O and Tachibana K 2008 Appl. Phys. Express 1 066003
41. Liu S, Hong W and Yuan N 2006 Int. J. Infrared Millim. Waves 27 403
42. Shiveshwari L and Mahto P 2006 Solid State Commun. 138 160
43. Fan W and Dong L 2010 Phys. Plasmas 17 073506
44. Yin Y, Xu H, Yu M Y, Ma Y Y, Zhuo H B, Tian C L and Shao F Q 2009 Phys. Plasmas 16 102103
45. Kong X K, Liu S B, Zhang H F and Li C Z 2010 Phys. Plasmas 17 103506
46. Sakai O, Kishimoto Y and Tachibana K 2005 J. Phys. D: Appl. Phys. 38 431
47. Sakai O, Sakaguchi T and Tachibana K 2007 Contrib. Plasma Phys. 19 96
48. Cao Z, Nie Q, Bayliss D L, Walsh J L, Ren C S, Wang D Z and Kong M G 2010 Plasma Sources Sci. Technol. 19 025003
49. Ho K M, Chan C T and Soukoulis C M 1990 Phys. Rev. Lett. 65 3152
50. Phihal M, Shambrook A, Maradudin A A and Sheng P 1991 Opt. Commun. 80 199
51. Kuzmiak V and Maradudin A A 1997 Phys. Rev. B 55 7427
52. Ito T and Sakoda K 2001 Phys. Rev. B 64 045117
53. Sakai O, Sakaguchi T and Tachibana K 2007 J. Appl. Phys. 101 073304
54. Lee H I and Mok M 2010 Phys. Plasmas 17 072108
55. Fan W, Zhang X and Dong L 2010 Phys. Plasmas 17 113501
56. McCall S L, Platzman P M, Dalichaouch R, Smith D and Schultz S 1991 Phys. Rev. Lett. 67 2017
57. Robertson W M, Arjavalingam G, Meade R D, Brommer K D, Rappe A M and Joannopoulos J D 1992 Phys. Rev. Lett. 68 2023
58. Sakai O, Naito T, Shimomura T and Tachibana K 2010 Thin Solid Films 518 3444
59. Shirafuji T, Kitagawa T, Wakai T and Tachibana K 2003 Appl. Phys. Lett. 83 2309
60. Abolmasov S N, Shirafuji T and Tachibana K 2005 IEEE Trans. Plasma Sci. 33 941
61. Muller K G 1988 Phys. Rev. A 37 4836
62. Sanpei A, Kiwamoto Y, Ito K and Soga Y 2003 Phys. Rev. E 68 016404
63. Schoenbach K H, Moselhy M and Wenhui S 2004 Plasma Sources Sci. Technol. 13 177
64. Dong L, Fan W, He Y, Liu F, Li S, Gao R and Wang L 2006 Phys. Rev. E 73 066206
65. Fan W, Dong L, Zhao H and Yang Y 2010 IEEE Trans. Plasma Sci. 37 1016
66. Lo J, Sokoloff J, Callegari Th and Boeuf J P 2010 Appl. Phys. Lett. 96 251501
67. Varault S, Gabard B, Sokoloff J and Bolioli S 2011 Appl. Phys. Lett. 98 134103
68. Giroud L, Sokoloff J and Pigaglio O 2009 J. Electromagn. Waves Appl. 23 1029
69. Sheng Z M, Zhang J and Umstadter D 2003 Appl. Phys. B 77 673
70. Wu H C, Sheng Z M and Zhang J 2005 Appl. Phys. Lett. 87 201502
71. Ganachev I P and Sugai H 2005 Surf. Coat. Technol. 200 792
72. Sakai O, Naito T and Tachibana K 2009 Plasma Fusion Res. 4 052
73. Sakai O 2011 Propagation of electromagnetic waves in and around plasmas Wave Propagation ed A A Petrin (Rijeka: Intech) p 331
74. Sakai O and Tachibana K 2007 IEEE Trans. Plasma Sci. 35 1267
75. Krenn J R, Dereux A, Weeber J C, Bourillot E, Lacroute Y, Goudonnet J P, Schider G, Gotschy W, Leitner A and Aussenegg F R 1999 Phys. Rev. Lett. 82 2590
76. Brongersma M L, Hartman J W and Atwater H A 2000 Phys. Rev. B 62 R16356
77. Popa B I and Kummer S A 2008 Phys. Rev. Lett. 100 207401
78. Maier S A, Kik P G and Atwater H A 2003 Phys. Rev. B 67 205402
79. Sakai O 2011 J. Appl. Phys. 109 084914
80. Smith D R, Padilla W J, Vier D C, Nemat-Nasser S C and Schultz S 2000 Phys. Rev. Lett. 84 4184
81. Sakai O, Shimomura T and Tachibana K 2010 Phys. Plasmas 17 123504
82. Chen L F, Ong K C, Nei C P, Varadan V V and Varadan V K 2004 Microwave Electronics (Chichester: Wiley) p 417
83. Bedair S S and Wolff I 1992 IEEE Trans. Microw. Theory Tech. 40 41
84. Feise M W, Shadrivov I V and Kivshar Y S 2004 Appl. Phys. Lett. 85 1451
85. Litchinitser N M, Gabitov I R and Maimistov A I 2007 Phys. Rev. Lett. 99 113902
86. Ciattoni A, Rizza C and Palange E 2010 Opt. Lett. 35 2130
87. Iza F and Hopwood J 2005 Plasma Sources Sci. Technol. 14 397
88. Ebbesen T W, Lezec H J, Ghaemi H F, Thio T and Wolff P A 1998 Nature 391 667
89. Pendry J B, Martin-Moreno L and Garcia-Videl F J 2004 Science 305 847
90. Lee D S, Sakai O and Tachibana K 2009 Japan. J. Appl. Phys. 48 062004
91. Anderson T, Alexeff I, Raynolds J, Farshi E, Parameswaran S and Pradeep E P 2007 IEEE Trans. Plasma Sci. 35 407
92. Chen L F, Ong K C, Nei C P, Varadan V V and Varadan V K 2004 Functionally Graded Materials: Design, Processing, and Applications Electronics (Dordrecht: Kluwer)
93. Mills D L 1991 Nonlinear Optics (Berlin: Springer)
94. Devaney R A 1989 An Introduction to Chaotic Dynamical Systems (New York: Perseus Books)
95. Rybak J P and Churchill R J 1971 IEEE Trans. Aerospace Electron. Syst. 7 879