Ultrasoft-X-ray emission spectroscopy using a newly designed wavelength-dispersive spectrometer attached to a transmission electron microscope

Journal of Electron Microscopy

Volumn 61, Issue 1, 2012, Pages 1-8

  Terauchi, Masami ^a   Takahashi, Hideyuki ^b   Handa, Nobuo ^b   Murano, Takanori ^b   Koike, Masato ^c   Kawachi, Tetsuya ^c   Imazono, Takashi ^c   Koeda, Masaru ^d   Nagano, Tetsuya ^d   Sasai, Hiroyuki ^d   Oue, Yuki ^d   Yonezawa, Zeno ^d   Kuramoto, Satoshi ^d  

^a TOHOKU UNIVERSITY   (Japan)

^b JEOL LTD   (Japan)

^c JAPAN ATOMIC ENERGY AGENCY   (Japan)

^d SHIMADZU CORPORATION   (Japan)

Author keywords

Li K emission; ultrasoft X ray emission; wavelength dispersive spectroscopy

Indexed keywords

ALUMINUM NITRIDE; BINARY ALLOYS; BINDING ENERGY; CHEMICAL SHIFT; DISPERSION (WAVES); ELECTROMAGNETIC WAVE EMISSION; EMISSION SPECTROSCOPY; INDIUM PHOSPHIDE; MAGNESIUM COMPOUNDS; SEMICONDUCTING INDIUM PHOSPHIDE; SILICA; SILICON CARBIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING; X RAY SPECTROMETERS; X RAY SPECTROSCOPY;

EMISSION SPECTRUMS; ENERGY RANGES; LI-K EMISSION; MULTICHANNEL PLATES; TRANSMISSION ELECTRON; ULTRASOFT-X-RAY EMISSION; WAVELENGTH DISPERSIVE SPECTROMETERS; X RAY EMISSION SPECTROSCOPY; X-RAY EMISSION; X-RAY SPECTROSCOPY;

III-V SEMICONDUCTORS;

EID: 84856816018     PISSN: 00220744     EISSN: 14779986     Source Type: Journal    
DOI: 10.1093/jmicro/dfr076     Document Type: Article

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