Unipolar pulse electrodeposition of nickel hexacyanoferrate thin films with controllable structure on platinum substrates

Thin Solid Films

Volumn 520, Issue 7, 2012, Pages 2438-2448

  Hao, Xiaogang ^a   Yan, Tao ^a   Wang, Zhongde ^a   Liu, Shibin ^a   Liang, Zhenhai ^a   Shen, Yinghua ^a   Pritzker, Mark ^b  

^a TAIYUAN UNIVERSITY OF TECHNOLOGY   (China)

^b UNIVERSITY OF WATERLOO   (Canada)

Author keywords

Charge transfer; Cyclic voltammetry; Nickel hexacyanoferrate; Solo structure; Stability; Thin films; Unipolar pulse electrodeposition

Indexed keywords

CATHODIC POTENTIALS; CATHODIC PULSE; CONTROLLABLE STRUCTURES; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FILM ELECTRODES; GOOD STABILITY; HIGH DYNAMIC; MORPHOLOGY AND COMPOSITION; NICKEL HEXACYANOFERRATE; NICKEL HEXACYANOFERRATE THIN FILM; OPEN-CIRCUIT POTENTIAL; PLATINUM SUBSTRATES; POTENTIAL CYCLING; PRIMARY FACTORS; PULSE DEPOSITION; UNIPOLAR PULSE; UNIT CELLS;

CHARGE TRANSFER; CONVERGENCE OF NUMERICAL METHODS; ELECTROCHEMICAL PROPERTIES; ELECTRODEPOSITION; NICKEL; PLATINUM; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; THIN FILMS; VAPOR DEPOSITION; X RAY SPECTROSCOPY;

CYCLIC VOLTAMMETRY;

EID: 84856373612     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.10.005     Document Type: Article

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