Visible light photo response from N-doped anodic niobium oxide after annealing in ammonia atmosphere

Electrochimica Acta

Volumn 62, Issue , 2012, Pages 402-407

  Ruff, T ^a   Hahn, R ^a   Killian, M S ^a   Asoh, H ^b   Ono, S ^b   Schmuki, P ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b KOGAKUIN UNIVERSITY   (Japan)

Author keywords

Ammonia; Anodic; High temperature; Niobium oxide; Nitrogen doping

Indexed keywords

AMMONIA ATMOSPHERE; ANODIC; ANODIC OXIDE LAYERS; ELECTROCHEMICAL ANODIZATIONS; HIGH TEMPERATURE; N-DOPED; NITROGEN DOPING; OPTIMIZED CONDITIONS; PHOTO-ELECTROCHEMICAL METHOD; PHOTORESPONSES; TOF SIMS; VISIBLE LIGHT; VISIBLE RANGE; XRD;

AMMONIA; ANODIC OXIDATION; LIGHT; NIOBIUM; OXIDE FILMS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING;

NIOBIUM OXIDE;

EID: 84856228058     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.12.045     Document Type: Article

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