Towards compact three-dimensional magnetoelectronics-magnetoresistance in rolled-up Co/Cu nanomembranes

Applied Physics Letters

Volumn 100, Issue 2, 2012, Pages

  Muller C ^a   Bof Bufon, C C ^b   Navarro Fuentes, M E ^b   Makarov, D ^b   Mosca, D H ^a   Schmidt, O G ^b  

^a FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

^b IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CU LAYERS; CURRENT LINES; EFFECTIVE AREA; ELECTRONIC COMPONENT; FABRICATION PROCESS; FILM PLANES; HIGH QUALITY; MAGNETIC SENSING; NANOMEMBRANES; STRAIN ENGINEERING; THREE-DIMENSIONAL ARCHITECTURE; TOPDOWN;

COPPER; ELECTRIC RESISTANCE; MAGNETORESISTANCE; NANOSTRUCTURES; THREE DIMENSIONAL; WINDING;

MAGNETOELECTRONICS;

EID: 84855937994     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3676269     Document Type: Article

References (19)

1. J. Bachmann, J. Jing, M. Knez, S. Barth, H. Shen, S. Mathur, U. Gösele, and K. Nielsch, J. Am. Chem. Soc. 129, 9554 (2007). 10.1021/ja072465w (Pubitemid 47237443)
2. F. Ballhorn, S. Mansfeld, A. Krohn, J. Topp, W. Hansen, D. Heitmann, and S. Mendach, Phys. Rev. Lett. 104, 037205 (2010). 10.1103/PhysRevLett.104.037205
3. E. Bermdez-Urea, Y. F. Mei, E. Coric, D. Marakov, M. Albrecht, and O. G. Schmidt, J. Phys. D: Appl. Phys. 42, 055001 (2009). 10.1088/0022-3727/42/5/ 055001
4. S. J. Son, J. Reichel, B. He, M. Schuchman, and S. B. Lee, J. Am. Chem. Soc. 127, 7316 (2005). 10.1021/ja0517365 (Pubitemid 40746010)
5. A. A. Solovev, Y. F. Mei, E. Bermdez-Urea, G. Huang, and O. G. Schmidt, Small 5, 1688 (2009). 10.1002/smll.200900021
6. M. N. Baibich, J. M. Broto, A. Fert, F. N. Van Dau, F. Petroff, P. Eitenne, G. Greuzet, A. Friederich, and J. Chazelas, Phys. Rev. Lett. 61, 2472 (1988). 10.1103/PhysRevLett.61.2472
7. G. Binash, P. Grünberg, F. Saurenbach, and W. Zinn, Phys. Rev. B 39, 4828 (1989). 10.1103/PhysRevB.39.4828
8. D. H. Mosca, F. Petroff, A. Fert, P. A. Schroeder, W. P. Pratt, Jr. , and R. Laloee, J. Magn. Magn. Mater. 94, L1 (1991). 10.1016/0304-8853(91)90102-G
9. O. G. Schmidt and K. Eberl, Nature 410, 168 (2001). 10.1038/35065525 (Pubitemid 32216580)
10. V. Y. Prinz, V. A. Selezenev, A. K. Gutakovsky, A. V. Chehovskiy, V. V. Preobrazhenskii, M. A. Putyato, and T. A. Gavrilova, Physica E 6, 828 (2000). 10.1016/S1386-9477(99)00249-0
11. Y. F. Mei, G. Huang, A. S. Solovev, E. B. Urea, I. Mönch, F. Die, T. Reindl, R. K. Y. Fu, P. K. Chu, and O. G. Schmidt, Adv. Mater. 20, 4085 (2008). 10.1002/adma.200801589
12. C. C. B. Bufon, J. D. C. Gonzalez, D. J. Thurmer, D. Grimm, M. Bauer, and O. G. Schmidt, Nano Lett. 10, 2506 (2010). 10.1021/nl1010367
13. C. C. B. Bufon, J. D. A. Espinoza, D. J. Thurmer, M. Bauer, C. Deneke, U. Zschieschang, H. Klauk, and O. G. Schmidt, Nano Lett. 11, 3727 (2011). 10.1021/nl201773d
14. I. Mönch, D. Makarov, R. Koseva, L. Baraban, D. Karnaushenko, C. Kaiser, K.-F. Arndt, and O. G. Schmidt, ACS Nano 5, 7436 (2011). 10.1021/nn202351j
15. Y. Chen, Y. Mei, R. Kaltofen, J. I. Mönch, J. Schuhmann, J. Freudenberger, H.-J. Klau, and O. G. Schmidt, Adv. Mater. 20, 3224 (2008). 10.1002/adma.200800230
16. A. Paul, T. Damm, D. E. Bürgeler, S. Stein, H. Kohlstedt, and P. Grünberg, J. Phys.: Condens. Matter 15, 2471 (2003). 10.1088/0953-8984/15/ 17/304
17. S. R. Pollack and C. E. Morris, J. Appl. Phys. 35, 1503 (1964). 10.1063/1.1713657
18. C. Müller, M. S. Khatri, C. Deneke, S. Fähler, Y. F. Mei, E. Bermdez-Urea, and O. G. Schmidt, Appl. Phys. Lett. 94, 102510 (2009). 10.1063/1.3095831
19. B. Dieny, V. S. Speriosu, S. Metin, S. S. P. Parkin, B. A. Gurney, P. Baumgart, and D. R. Wilhoit, J. Appl. Phys. 69, 4774 (1991). 10.1063/1.348252