Isotropic negative thermal expansion in β-Si(NCN) 2 and its origin

Journal of Physical Chemistry C

Volumn 116, Issue 1, 2012, Pages 526-531

  Kroll, Peter ^a   Andrade, Miria ^b   Yan, Xuehua ^b,c   Ionescu, Emanuel ^b   Miehe, Gerhard ^b   Riedel, Ralf ^b  

^a UNIVERSITY OF TEXAS AT ARLINGTON   (United States)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^c JIANGSU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO MOLECULAR DYNAMICS; ATOMISTIC ANALYSIS; CARBODIIMIDES; EXPERIMENTAL VALUES; HIGH TEMPERATURE; ISOTROPIC NEGATIVE THERMAL EXPANSION; LINEAR EXPANSION COEFFICIENT; SI ATOMS; TEMPERATURE INCREASE; TEMPERATURE STABILITY; TRANSVERSE VIBRATIONS; VIBRATIONAL MOTIONS;

BUOYANCY; CENTRIFUGATION; COMPUTER SIMULATION; CRYSTALLOGRAPHY; EXPANSION; MOLECULAR DYNAMICS; SILICON; VIBRATION ANALYSIS;

THERMAL EXPANSION;

EID: 84855870844     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp2106583     Document Type: Article

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