In situ kinetic study of zinc sulfide activation using a quartz crystal microbalance with dissipation (QCM-D)

Journal of Colloid and Interface Science

Volumn 368, Issue 1, 2012, Pages 512-520

  Teng, Fucheng ^a   Liu, Qingxia ^a   Zeng, Hongbo ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

Activation kinetics; QCM D; Surface adsorption; Zinc sulfide activation

Indexed keywords

ACTIVATION KINETICS; ADSORPTION MEASUREMENT; ARGON SPUTTERING; CRYSTALLOGRAPHIC STRUCTURE; IN-SITU; INITIAL STAGES; LOGARITHMIC FUNCTIONS; MASS INCREASE; MINERAL PROCESS; PARABOLIC LAW; QCM-D; QUARTZ CRYSTAL MICROBALANCE WITH DISSIPATION; SURFACE ADSORPTION; SURFACE WETTABILITY; TIME CURVES; TWO STAGE; XPS MEASUREMENTS;

ADSORPTION; CHEMICAL ACTIVATION; KINETICS; QUARTZ; REACTION KINETICS; SILVER; SULFUR COMPOUNDS; SURFACE PROPERTIES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC COATINGS; ZINC SULFIDE;

QUARTZ CRYSTAL MICROBALANCES;

ARGON; POTASSIUM; SILVER; XANTHIC ACID DERIVATIVE; ZINC SULFIDE;

ADSORPTION; ARTICLE; CHEMICAL COMPOSITION; CHEMICAL REACTION KINETICS; CRYSTAL STRUCTURE; PRIORITY JOURNAL; QUARTZ CRYSTAL MICROBALANCE; SENSOR; SURFACE PROPERTY; WETTABILITY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84855862445     PISSN: 00219797     EISSN: 10957103     Source Type: Journal    
DOI: 10.1016/j.jcis.2011.10.048     Document Type: Article

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