Preparation of exfoliated Bi 2Te 3 thin films

AIP Conference Proceedings

Volumn 1416, Issue , 2011, Pages 135-138

  Luo, Jiajun ^a   Late, Dattatray ^a   Wu, Isaac ^a   Biswas, Kanishka ^b   Kanatzidis, Mercouri ^b   Grayson, Matthew ^a  

^a Northwestern University   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

Author keywords

Electron beam fabrication; Thin film exfoliation; Topological Insulator

Indexed keywords

EID: 84855801012     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3671716     Document Type: Conference Paper

References (6)

1. R. Venketasubramanian, E. Siivola, T. Colpitts, and B. O'Quinn, Nature, 413, 597-602 (2001).
2. H. Zhang, C. X. Liu, X. L. Qi, X. Dai, Z. Fang, and S. C. Zhang, Nature Physics, 5, 438-442 (2009).
3. Y. L. Chen, J. G. Analytis, J. H. Chu, Z. K. Liu, S. K. Mo, X. L. Qi, H. J. Zhang, D. H. Lu, X. Dai, Z. Fang, S. C. Zhang, I. R. Fisher, Z. Hussain, and Z. X. Shen, Science, 325, 178-181 (2009).
4. P. Ghaemi, R. S. K. Mong, and J. E. Moore, Phys. Rev. Lett., 105, 166603 (2010).
5. C. B. Satterthwaite and R. W. Ure Jr., Phys. Rev., 108, 1164 (1957).
6. A. R. Varrenti, C. Zhou, A. G. Klock, S. H. Chyung, J. Long, S. O. Memik, and M. Grayson, IEEE Electron Device Lett., 32, 818-820 (2011)