Influence of Nd 3+ doping on the structural and near-IR photoluminescence properties of nanostructured TiO 2 films

Energy Procedia

Volumn 10, Issue , 2011, Pages 167-171

  Pandiyan, R ^a,b,c   Bartali, R ^b   Micheli, V ^b   Gottardi, G ^b   Luciu, I ^a,b   Ristic, D ^d   Alombert Goget, G ^d   Ferrari, M ^d   Laidani, N ^b  

^a UNIVERSITY OF TRENTO   (Italy)

^b FONDAZIONE BRUNO KESSLER   (Italy)

^c PSL RESEARCH UNIVERSITY   (France)

^d IFN CNR   (Italy)

Author keywords

Co sputtering; Neodymium; Photoluminescence; Rare earth doping; Titanium dioxide films

Indexed keywords

AIR AMBIENT; CHEMICAL COMPOSITIONS; COSPUTTERING; DOPED FILMS; DOPING CONCENTRATION; EXCITED LEVELS; FILM PROPERTIES; HOST MATRICES; NANOSTRUCTURED TIO; NEAR-IR; PHOTOLUMINESCENCE EMISSION; PHOTOLUMINESCENCE PROPERTIES; RADIO-FREQUENCY CO-SPUTTERING; RARE EARTH DOPING; ROOM TEMPERATURE; SILICON SUBSTRATES; SILICON-BASED; SOLAR SPECTRUM; TIO; TITANIUM DIOXIDE FILMS; WIDE BAND-GAP MATERIAL;

AUGER ELECTRON SPECTROSCOPY; ENERGY GAP; GEOCHEMISTRY; NEODYMIUM; PHOTOLUMINESCENCE; PHOTOVOLTAIC EFFECTS; QUARTZ; TITANIUM; TITANIUM DIOXIDE; X RAY DIFFRACTION;

SEMICONDUCTOR DOPING;

EID: 84855697625     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2011.10.171     Document Type: Conference Paper

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