Film stability during postassembly morphological changes in polyelectrolyte multilayers due to acid and base exposure

Langmuir

Volumn 28, Issue 1, 2012, Pages 841-848

  Cho, Chungyeon ^a   Zacharia, Nicole S ^a,b  

^a TEXAS A AND M UNIVERSITY   (United States)

^b Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; EXPOSURE-TIME; FILM STABILITY; FTIR SPECTROSCOPY; LAYER-BY-LAYER TECHNIQUES; MORPHOLOGICAL CHANGES; MORPHOLOGICAL TRANSITIONS; MORPHOLOGICAL VARIATION; PH CHANGE; PH TREATMENT; POLY(ALLYLAMINE HYDROCHLORIDE); POLY(ETHYLENEIMINE); POLYACRYLIC ACIDS; POLYANIONS; POLYCATIONS; POLYELECTROLYTE MULTILAYER; POROUS MORPHOLOGY; POROUS STRUCTURES; STRUCTURAL REARRANGEMENT; STRUCTURAL REORGANIZATION; WEAK POLYELECTROLYTES;

CARBOXYLIC ACIDS; ETHYLENE; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FUNCTIONAL MATERIALS; MORPHOLOGY; OPTICAL MICROSCOPY; POLYELECTROLYTES; POLYETHYLENES; QUARTZ; QUARTZ CRYSTAL MICROBALANCES;

MULTILAYERS;

EID: 84855682683     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la203522z     Document Type: Article

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