Effect of simultaneous etching and N-doping on the surface and electrochemical properties of AC

Journal of Industrial and Engineering Chemistry

Volumn 18, Issue 1, 2012, Pages 116-122

  Lim, Jae Won ^a   Jeong, Euigyung ^a   Jung, Min Jung ^a   Lee, Sang Ick ^b   Lee, Young Seak ^a  

^a Chungnam National University   (South Korea)

^b GS Caltex Corporation   (South Korea)

Author keywords

Activated carbon (AC); Chemical treatment; EDLC; Heat treatment

Indexed keywords

AMMONIA GAS; AMMONIA TREATMENT; CHEMICAL TREATMENT; EDLC; ELECTRIC DOUBLE LAYER CAPACITOR; ELECTRICAL PERFORMANCE; ETCHING EFFECT; GASPHASE; HIGH TEMPERATURE; MESOPORE VOLUME; N-DOPING; NITROGEN FUNCTIONAL GROUPS; NITROGEN GAS; SCAN RATES; SPECIFIC CAPACITANCE; TREATMENT TIME;

ACTIVATED CARBON; AMMONIA; ELECTRIC PROPERTIES; ETCHING; FUNCTIONAL GROUPS; HEAT TREATMENT; NITROGEN; SPECIFIC SURFACE AREA; SURFACE STRUCTURE;

ELECTROCHEMICAL PROPERTIES;

EID: 84855482607     PISSN: 1226086X     EISSN: 22345957     Source Type: Journal    
DOI: 10.1016/j.jiec.2011.11.074     Document Type: Article

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