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Journal of Applied Physics

Volumn 110, Issue 12, 2011, Pages

Transverse thermoelectric response in tilted orientation La 1-xSr xCoO 3 (0.05 ≤ x ≤ 0.4) thin films

(4) Wang, Y a Yu, L a,b Jiang, B c Zhang, P X a,b

a KUNMING UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

b MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG (Germany)

c XIANGTAN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

DECAY PROCESS; FAST RESPONSE; PHYSICAL PARAMETERS; PULSE LASER; PULSE LASER DEPOSITION; RESPONSIVITY; ROOM TEMPERATURE; SINGLE PHASE; THERMAL SOURCE; THERMOELECTRIC RESPONSE; THERMOELECTRIC VOLTAGE; TIME RESPONSE; VOLTAGE RESPONSE;

COBALT COMPOUNDS; EPITAXIAL GROWTH; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

VAPOR DEPOSITION;

EID: 84855338178 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3673552 Document Type: Article

Times cited : (31)

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