Substrate-induced anisotropy of c-axis textured NaxCoO2 thin films

Progress in Solid State Chemistry

Volumn 35, Issue 2-4 SPEC. ISS., 2007, Pages 545-551

  Yu, L ^a,b   Krockenberger, Y ^a   Fritsch, Ingo ^a   Habermeier, H U ^a  

^a MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

^b KUNMING UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

NaxCoO2 thin films; Pulsed laser deposition; Resistivity anisotropy; Vicinal STO substrates

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; PULSED LASER DEPOSITION; SODIUM COMPOUNDS; STRONTIUM COMPOUNDS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

RESISTIVITY ANISOTROPY; THERMOELECTRIC THIN FILM DEVICES;

THIN FILMS;

EID: 34347216726     PISSN: 00796786     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.progsolidstchem.2007.01.031     Document Type: Review

References (17)

1. Takada, Sakurai H., Takayama-Muromachi E., Izumi F., Dilanian R.A., and Sasaki T. Nature 422 (2003) 53-55
2. Terasaki I., Sasago Y., and Uchinokura K. Phys Rev B 56 (1997) R12685-R12687
3. Motohashi T., Naujalis E., Ueda R., Isawa K., Karppinen M., and Yamauchi H. Appl Phys Lett 79 (2001) 1480-1482
4. Ohta H., Kim S.W., Ohta S., Koumoto K., Hirano M., and Hosono H. Cryst Growth Des 5 (2005) 25-28
5. Terasaki I. In: Proceedings of the 19th international conference on thermoelectrics (ICT 2000), UK, August 20-24, 2000.
6. Ono Y., Ishikawa R., Miyazaki Y., Ishii Y., Morii Y., and Kajitani T. J Solid State Chem 166 (2002) 177-181
7. Mikami M., Yoshimura M., Mori Y., Sasaki T., Funahashi R., et al. Jpn J Appl Phys 42 (2003) 7383-7386
8. Foo M.L., Wang Y., Watauchi S., Zandbergen H.W., He T., Cava R.J., et al. Phys Rev Lett 92 (2004) 247001-1-4
9. Lengfellner H., Zeuner S., Prettl W., and Renk K.F. Europhys Lett 25 (1994) 375
10. Haage T., Habermeier H.-U., and Zegenhagen J. Surf Sci 370 (1997) L158
11. Habermeier H.-U., Li X.H., Zhang P.X., and Leibold B. Solid State Commun 110 (1999) 473-478
12. Li X.H., Habermeier H.-U., and Zhang P.X. J Magn Magn Mater 211 (2000) 232-237
13. Zhang P.X., Wang C., Zhang G.Y., Yu L., Lee W.K., and Habermeier H.-U. Opt Laser Technol 36 (2004) 341-343
14. Merino J., and McKenzie R.H. Phys Rev B 61 (2000) 7996-8008
15. Krockenberger Y., Frisch I., and Cristiani G. Appl Phys Lett 86 (2005) 191913-1-3
16. Krockenberger Y., Fritsch I., Christiani G., Habermeier H.-U., Yu L., Bernhard C., et al. Appl Phys Lett 88 (2006) 162501-1-3
17. Haage T., Zegenhagen J., Li J.Q., Habermeier H.-U., Cardona M., Jooss Ch., et al. Phys Rev B 56 (1997) 8404-8418