Effect of oxygen partial pressure on the optical property of amorphous titanium oxide thin films

Energy Procedia

Volumn 12, Issue , 2011, Pages 450-455

  Ju, Yongfeng ^a   Li, Lin ^a   Wu, Zhiming ^a   Jiang, Yadong ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Amorphous titanium oxide; Magnetron sputtering; Optical properties

Indexed keywords

AMORPHOUS FILMS; ELECTRIC POWER TRANSMISSION NETWORKS; ENERGY GAP; MAGNETRON SPUTTERING; OXIDE FILMS; OXYGEN; PARTIAL PRESSURE; SMART POWER GRIDS; SPUTTERING; SUBSTRATES; THIN FILMS; TITANIUM; TITANIUM OXIDES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS THIN FILMS; AMORPHOUS TITANIUM OXIDE; DC REACTIVE MAGNETRON SPUTTERING; EFFECT OF OXYGEN; K9 GLASS SUBSTRATE; OXYGEN PARTIAL PRESSURE; PURE TITANIUMS; TIOX THIN FILMS;

OPTICAL PROPERTIES;

EID: 84555204652     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2011.10.060     Document Type: Conference Paper

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