Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithography

Journal of Vacuum Science and Technology B

Volumn 29, Issue 6, 2011, Pages

  He, Jian ^a   Richter, K ^a   Bartha, J W ^a   Howitz, S ^b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b Gesellschaft fuer Silizium Mikrosysteme MbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; FABRICATION; SILICON; SURFACE ROUGHNESS;

DEMOLDING FORCES; ETCHED STRUCTURES; ETCHING MASKS; ETCHING PROCESS; FLOWRATE RATIO; LATERAL DIMENSION; NANO METER RANGE; SIDEWALL ANGLES;

NANOIMPRINT LITHOGRAPHY;

EID: 84255172438     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3662094     Document Type: Article

References (4)

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