In-situ synchrotron x-ray study of the crystallization behavior of Ce 0.9La0.1O2-x thin films deposited on NiW alloy substrates by chemical solution method

Materials Letters

Volumn 65, Issue 17-18, 2011, Pages 2669-2672

  Zhao, Y ^a   Grivel, J C ^a   Abrahamsen, A B ^a   Pallewatta, P G A P ^a   He, D ^a   Bednarcik J ^b   Zimmermann, M V ^b  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b DESY   (Germany)

Author keywords

Chemical solution deposition; Crystallization; Epitaxial growth; Synchrotron radiation; Thin films

Indexed keywords

CHEMICALS; CRYSTALLIZATION; DEPOSITION; EPITAXIAL GROWTH; GRAIN GROWTH; SYNCHROTRON RADIATION; SYNCHROTRONS; X RAY DIFFRACTION;

CHEMICAL SOLUTION DEPOSITION; CHEMICAL SOLUTION METHOD; CRYSTALLIZATION BEHAVIOR; CRYSTALLIZATION TRANSITIONS; IN-SITU SYNCHROTRONS; INTERFACIAL NUCLEATION; JOHNSON-MEHL-AVRAMI-KOLMOGOROV EQUATION; NONDESTRUCTIVE METHODS;

THIN FILMS;

EID: 83755198533     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2011.05.072     Document Type: Article

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